Etching equipment and etching system

The embodiment of the utility model provides etching equipment and an etching system, the etching equipment comprises an etching cavity and a pressure gauge, the etching cavity is connected with the pressure gauge through a connecting pipeline, the etching equipment further comprises a filter, the filter is installed on the connecting pipeline, and the filter is connected with the pressure gauge through a connecting pipeline. Plasma gas in the etching process passes through the filter to enter the pressure gauge, and the filter is used for filtering polymers generated in the etching process. By additionally arranging the filter on the connecting pipeline between the etching cavity and the pressure gauge, polymers generated in the filtering process and the filter can block most of the polymers outside the pressure gauge, the service life of the pressure gauge can be effectively prolonged, the problems that the sensitivity of the pressure gauge is reduced and the pressure gauge fails are solved, and the service