Silicon wafer production line measuring equipment calibration device based on Fourier infrared principle

The utility model discloses an online in-situ calibration device for silicon wafer production line measuring equipment based on the Fourier infrared principle, which comprises a first wafer-level sample bracket, a second wafer-level sample bracket and an infrared wavelength standard substance diaphragm, and the edge of the infrared wavelength standard substance diaphragm is fixed between the first wafer-level sample bracket and the second wafer-level sample bracket in a bonding manner. According to the calibration device provided by the utility model, the sizes of the first wafer-level sample bracket and the second wafer-level sample bracket are determined according to the specification of a silicon wafer of a production line, and the calibration device is directly arranged on a sample table of silicon wafer production line measurement equipment based on the Fourier infrared principle during measurement; according to the method, an accessory component used for fixing the silicon wafer on the sample table does