Wafer heat treatment cavity device

The utility model discloses a wafer heat treatment cavity device which comprises a heating box, the top of the heating box is fixedly provided with a laser emission head, the inner wall of the heating box is fixedly connected with a fixed plate, the inner side of the fixed plate is rotatably provide...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ZHAO HAORAN, LI HONGYE, BAI YERU, CHU YINA
Format: Patent
Sprache:chi ; eng
Schlagworte:
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