Shaking mechanism of wafer cleaning tank

The utility model discloses a waggling mechanism of a wafer cleaning tank, which comprises a box body, a plurality of groups of supporting legs are fixedly arranged at the bottom of the box body, the supporting legs are positioned at four corners of the bottom of the box body, a power distribution control box is arranged outside the box body, a control panel is arranged on the upper base surface of the power distribution control box, and a driving assembly is fixedly arranged at the bottom of the box body. The driving assembly is fixedly installed on the bottom face in the box body, the output end of the driving assembly is in transmission connection with a cleaning tank, multiple sets of limiting rods are installed at the two ends of the cleaning tank correspondingly, limiting grooves are formed in the connecting positions of the box body and the limiting rods, and the ends, away from the cleaning tank, of the limiting rods are connected into the limiting grooves. Therefore, the device can fully clean the wa