Single crystal silicon rod drawing device
The embodiment of the utility model provides a single crystal silicon rod drawing device, which comprises a furnace body, a drawing device, a drawing device, a drawing device and a control device, and the furnace body is provided with a furnace cover; the crucible is arranged in the furnace body and...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The embodiment of the utility model provides a single crystal silicon rod drawing device, which comprises a furnace body, a drawing device, a drawing device, a drawing device and a control device, and the furnace body is provided with a furnace cover; the crucible is arranged in the furnace body and is used for accommodating silicon liquid so as to grow a silicon single crystal rod from the silicon liquid; the thermal field component is arranged in the furnace body and is positioned above the crucible; the annular magnetic control device is arranged in the furnace body, and at least part of the magnetic control device is located between the thermal field component and the furnace cover. According to the single crystal silicon rod drawing device disclosed by the embodiment of the invention, the impurity content in the silicon liquid can be reduced, and the crystal drawing quality of the single crystal silicon rod is improved.
本申请实施例提供了一种单晶硅棒拉制装置,所述单晶硅棒拉制装置包括:炉体,所述炉体具有炉盖;坩埚,所述坩埚设置于所述炉体内,用于容纳硅液,以从所述硅液中生长单晶硅棒;热场部 |
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