Gas source protection mechanism of PECVD (plasma enhanced chemical vapor deposition) equipment

The utility model discloses a gas source protection mechanism of PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment, which relates to the technical field of PECVD equipment and comprises an equipment main body and a delivery pipe communicated with the side wall of the equipment main body, the end face of the delivery pipe is communicated with an external pipe, and a connecting assembly is arranged between the delivery pipe and the external pipe. According to the gas source protection mechanism of the PECVD equipment, provided by the utility model, by utilizing the sliding barrel which is arranged on the second connecting pipe in a sliding manner, when the second connecting pipe is in butt joint with the first connecting pipe, two ends of the sliding barrel can respectively abut against the first ball valve and the second ball valve to slide; the first ball valve and the second ball valve can slide in the direction away from each other, so that after the conveying pipe is in butt joint with the extern