Magnetic field analysis device and ion implantation equipment

The utility model provides a magnetic field analysis device and ion implantation equipment, the magnetic field analysis device comprises a graphite plate structure arranged in an analysis magnetic field coil, the graphite plate structure comprises at least one graphite plate, and one side, facing th...

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1. Verfasser: LIANG WENJI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The utility model provides a magnetic field analysis device and ion implantation equipment, the magnetic field analysis device comprises a graphite plate structure arranged in an analysis magnetic field coil, the graphite plate structure comprises at least one graphite plate, and one side, facing the ion beam implantation direction, of the at least one graphite plate is arranged to be zigzag. The side facing the ion beam injection direction is arranged to be zigzag, and compared with a graphite plate of which the surface is arranged to be planar, the peeling phenomenon of the graphite plate caused by ion beam bombardment can be effectively reduced, the falling of graphite particles is reduced, and the service life of the graphite plate is prolonged. Besides, the graphite plate is arranged to be in a sawtooth shape, when the graphite plate is bombarded by the ion beam to generate particles, the graphite particles can fall into gaps between the sawteeth, the graphite particles are effectively prevented from bei