Ceramic disc cleaning device for silicon wafer polishing

The utility model discloses a ceramic disc cleaning device for silicon wafer polishing. The ceramic disc cleaning device comprises a cleaning mechanism and a lifting mechanism. The cleaning mechanism comprises a brush, a supporting rod and a first driving device located on the supporting rod. The first driving device can drive the brush to horizontally reciprocate along the supporting rod; the lifting mechanism comprises a main lifting mechanism and an auxiliary lifting mechanism which are located below the two ends of the supporting rod respectively. The main lifting mechanism comprises a second driving device, an adjusting block and a first connecting plate from bottom to top; the upper end of the first connecting plate is fixedly connected with the end of the supporting rod, and the lower end is movably connected with the upper end of the adjusting block. The second driving device comprises a fixed end and a telescopic end, and the lower end of the adjusting block is connected to the telescopic end in a he