Silicon carbide wafer cleaning device

The utility model discloses a silicon carbide wafer cleaning device, which relates to the technical field of wafer cleaning, and comprises a bottom plate, the middle part of the bottom plate is fixedly connected with a first cleaning bath, one side of the first cleaning bath is fixedly communicated with a water pump, the output end of the water pump is fixedly communicated with a spray head, and the spray head is fixedly communicated with a water pump. And one side of the spray head is fixedly connected to one side of the inner wall of the first cleaning bath tank, a second cleaning bath tank is arranged on one side of the first cleaning bath tank, and the bottom end of the second cleaning bath tank is fixedly connected to the top end of the bottom plate. The cleaning solvent in the first cleaning bath tank is driven to flow through the matching effect of the water pump and the spray head, and the output end of the spray head directly faces the middle of one end of the positioning plate, so that the cleaning