Wafer cleaning device

The utility model discloses a wafer cleaning device. The wafer cleaning device comprises a wafer carrying table which comprises a wafer supporting piece and supports a wafer to be cleaned in a single-point mode so that the wafer to be cleaned can be fixed in a suspended mode; the cleaning arm compri...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: ZHOU XIANBING
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!