Wafer cleaning device

The utility model discloses a wafer cleaning device. The wafer cleaning device comprises a wafer carrying table which comprises a wafer supporting piece and supports a wafer to be cleaned in a single-point mode so that the wafer to be cleaned can be fixed in a suspended mode; the cleaning arm comprises an upper edge arm, the front end of the upper edge arm is provided with a first nozzle, the lower edge arm is correspondingly arranged below the upper edge arm, the front end of the lower edge arm is provided with a second nozzle, the wafer to be cleaned is suspended and fixed between the upper edge arm and the lower edge arm, and the upper edge arm and the lower edge arm keep synchronous displacement. And the first nozzle and the second nozzle synchronously discharge water, so that the spraying pressures on the corresponding positions of the upper surface and the lower surface of the wafer to be cleaned are cancelled. By using the wafer cleaning device, not only can the shielding area of the supporting area be