Novel wet process chain type etching machine table
The utility model relates to the technical field of etching machine tables of photovoltaic cells, and particularly discloses a novel wet process chain type etching machine table which comprises a main groove, a circulating groove and an auxiliary groove which are communicated with outside air. Etchi...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | ZHANG GENG YANG WEIGUANG JIANG JIANTING BAI LIJUN |
| description | The utility model relates to the technical field of etching machine tables of photovoltaic cells, and particularly discloses a novel wet process chain type etching machine table which comprises a main groove, a circulating groove and an auxiliary groove which are communicated with outside air. Etching liquid is contained in the auxiliary tank, and a circulating pump is mounted in the auxiliary tank, so that the etching liquid in the auxiliary tank is pumped into the circulating tank through the circulating pump; the circulating tank is positioned on the side surface of the main tank, and the bottom of the circulating tank is communicated with the bottom of the main tank, so that the etching liquid in the circulating tank flows into the main tank; a plurality of rollers are arranged on the liquid level of the etching liquid in the main tank, a silicon wafer is placed on the top surface of each roller, so that the rollers rotate along the liquid level of the main tank to drive the etching liquid to etch the bac |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN220420539UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN220420539UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN220420539UU3</originalsourceid><addsrcrecordid>eNrjZDDyyy9LzVEoTy1RKCjKT04tLlZIzkjMzFMoqSxIVUgtSc7IzEtXyE0E0akKJYlJOak8DKxpiTnFqbxQmptByc01xNlDN7UgPz61uCAxOTUvtSTe2c_IyMDEyMDU2DI01JgoRQANZSya</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Novel wet process chain type etching machine table</title><source>esp@cenet</source><creator>ZHANG GENG ; YANG WEIGUANG ; JIANG JIANTING ; BAI LIJUN</creator><creatorcontrib>ZHANG GENG ; YANG WEIGUANG ; JIANG JIANTING ; BAI LIJUN</creatorcontrib><description>The utility model relates to the technical field of etching machine tables of photovoltaic cells, and particularly discloses a novel wet process chain type etching machine table which comprises a main groove, a circulating groove and an auxiliary groove which are communicated with outside air. Etching liquid is contained in the auxiliary tank, and a circulating pump is mounted in the auxiliary tank, so that the etching liquid in the auxiliary tank is pumped into the circulating tank through the circulating pump; the circulating tank is positioned on the side surface of the main tank, and the bottom of the circulating tank is communicated with the bottom of the main tank, so that the etching liquid in the circulating tank flows into the main tank; a plurality of rollers are arranged on the liquid level of the etching liquid in the main tank, a silicon wafer is placed on the top surface of each roller, so that the rollers rotate along the liquid level of the main tank to drive the etching liquid to etch the bac</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240130&DB=EPODOC&CC=CN&NR=220420539U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240130&DB=EPODOC&CC=CN&NR=220420539U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHANG GENG</creatorcontrib><creatorcontrib>YANG WEIGUANG</creatorcontrib><creatorcontrib>JIANG JIANTING</creatorcontrib><creatorcontrib>BAI LIJUN</creatorcontrib><title>Novel wet process chain type etching machine table</title><description>The utility model relates to the technical field of etching machine tables of photovoltaic cells, and particularly discloses a novel wet process chain type etching machine table which comprises a main groove, a circulating groove and an auxiliary groove which are communicated with outside air. Etching liquid is contained in the auxiliary tank, and a circulating pump is mounted in the auxiliary tank, so that the etching liquid in the auxiliary tank is pumped into the circulating tank through the circulating pump; the circulating tank is positioned on the side surface of the main tank, and the bottom of the circulating tank is communicated with the bottom of the main tank, so that the etching liquid in the circulating tank flows into the main tank; a plurality of rollers are arranged on the liquid level of the etching liquid in the main tank, a silicon wafer is placed on the top surface of each roller, so that the rollers rotate along the liquid level of the main tank to drive the etching liquid to etch the bac</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDyyy9LzVEoTy1RKCjKT04tLlZIzkjMzFMoqSxIVUgtSc7IzEtXyE0E0akKJYlJOak8DKxpiTnFqbxQmptByc01xNlDN7UgPz61uCAxOTUvtSTe2c_IyMDEyMDU2DI01JgoRQANZSya</recordid><startdate>20240130</startdate><enddate>20240130</enddate><creator>ZHANG GENG</creator><creator>YANG WEIGUANG</creator><creator>JIANG JIANTING</creator><creator>BAI LIJUN</creator><scope>EVB</scope></search><sort><creationdate>20240130</creationdate><title>Novel wet process chain type etching machine table</title><author>ZHANG GENG ; YANG WEIGUANG ; JIANG JIANTING ; BAI LIJUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN220420539UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHANG GENG</creatorcontrib><creatorcontrib>YANG WEIGUANG</creatorcontrib><creatorcontrib>JIANG JIANTING</creatorcontrib><creatorcontrib>BAI LIJUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHANG GENG</au><au>YANG WEIGUANG</au><au>JIANG JIANTING</au><au>BAI LIJUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Novel wet process chain type etching machine table</title><date>2024-01-30</date><risdate>2024</risdate><abstract>The utility model relates to the technical field of etching machine tables of photovoltaic cells, and particularly discloses a novel wet process chain type etching machine table which comprises a main groove, a circulating groove and an auxiliary groove which are communicated with outside air. Etching liquid is contained in the auxiliary tank, and a circulating pump is mounted in the auxiliary tank, so that the etching liquid in the auxiliary tank is pumped into the circulating tank through the circulating pump; the circulating tank is positioned on the side surface of the main tank, and the bottom of the circulating tank is communicated with the bottom of the main tank, so that the etching liquid in the circulating tank flows into the main tank; a plurality of rollers are arranged on the liquid level of the etching liquid in the main tank, a silicon wafer is placed on the top surface of each roller, so that the rollers rotate along the liquid level of the main tank to drive the etching liquid to etch the bac</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN220420539UU |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Novel wet process chain type etching machine table |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T23%3A05%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ZHANG%20GENG&rft.date=2024-01-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN220420539UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |