Novel wet process chain type etching machine table

The utility model relates to the technical field of etching machine tables of photovoltaic cells, and particularly discloses a novel wet process chain type etching machine table which comprises a main groove, a circulating groove and an auxiliary groove which are communicated with outside air. Etching liquid is contained in the auxiliary tank, and a circulating pump is mounted in the auxiliary tank, so that the etching liquid in the auxiliary tank is pumped into the circulating tank through the circulating pump; the circulating tank is positioned on the side surface of the main tank, and the bottom of the circulating tank is communicated with the bottom of the main tank, so that the etching liquid in the circulating tank flows into the main tank; a plurality of rollers are arranged on the liquid level of the etching liquid in the main tank, a silicon wafer is placed on the top surface of each roller, so that the rollers rotate along the liquid level of the main tank to drive the etching liquid to etch the bac