CVD (Chemical Vapor Deposition) vacuum reactor

The utility model relates to a CVD (chemical vapor deposition) vacuum reactor which comprises a reactor body, a gas delivery pump is fixed on the upper surface of the reactor body, the input end of the gas delivery pump is communicated with a first gas inlet pipe, the output end of the gas delivery...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	CHEN XIUKANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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