CVD (Chemical Vapor Deposition) vacuum reactor

The utility model relates to a CVD (chemical vapor deposition) vacuum reactor which comprises a reactor body, a gas delivery pump is fixed on the upper surface of the reactor body, the input end of the gas delivery pump is communicated with a first gas inlet pipe, the output end of the gas delivery...

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1. Verfasser: CHEN XIUKANG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The utility model relates to a CVD (chemical vapor deposition) vacuum reactor which comprises a reactor body, a gas delivery pump is fixed on the upper surface of the reactor body, the input end of the gas delivery pump is communicated with a first gas inlet pipe, the output end of the gas delivery pump is communicated with a second gas inlet pipe, and a uniform gas inlet mechanism is arranged on the upper surface of the reactor body. A placing seat is fixed on the inner bottom wall of the reactor body, and a positioning mechanism is arranged on the inner bottom wall of the placing seat. According to the CVD vacuum reactor, by arranging the rotating motor, the first belt pulley, the second belt pulley, the first connecting pipe, the second connecting pipe, the third connecting pipe and the gas outlet spray head, uniform gas inlet of the reactor body is achieved, a gaseous raw material can make uniform contact with a workpiece and react, the reaction effect is improved, and the problem that in the using proces