Imprint master mask, coupling-out structure, pupil expanding structure, diffractive optical waveguide and AR device

The utility model provides an imprint mother set, the imprint mother set is used for preparing a grating structure, the imprint mother set comprises a substrate, different positions of a first surface of the substrate are provided with first pattern areas, the first pattern areas are provided with u...

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Bibliographische Detailangaben
Hauptverfasser: CHEN HEFENG, LOU XINYE, CHEN ZHIGAO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The utility model provides an imprint mother set, the imprint mother set is used for preparing a grating structure, the imprint mother set comprises a substrate, different positions of a first surface of the substrate are provided with first pattern areas, the first pattern areas are provided with uneven surface contours, and the first pattern areas are provided with second pattern areas. The thickness of the substrate at different positions in the first pattern area is continuously changed, and the pattern of the grating structure is matched with the pattern of the first pattern area, so that the thickness of the formed grating structure is continuously changed. According to the technical scheme provided by the utility model, the problem of how to research and develop an imprinting mother set to manufacture a grating structure with continuously changed depth can be solved. The utility model further provides a coupling-out structure, a pupil expanding structure, a diffraction optical waveguide and AR equipmen