Adsorption and impurity removal system for boron and phosphorus impurities in trichlorosilane
The utility model discloses an adsorption and impurity removal system for boron and phosphorus impurities in trichlorosilane, which relates to the technical field of polycrystalline silicon production and comprises a feeding pipeline, an adsorption mechanism, a filtering mechanism, a buffer tank and...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The utility model discloses an adsorption and impurity removal system for boron and phosphorus impurities in trichlorosilane, which relates to the technical field of polycrystalline silicon production and comprises a feeding pipeline, an adsorption mechanism, a filtering mechanism, a buffer tank and a discharging pipeline which are sequentially arranged along the material flowing direction, the adsorption mechanism is used for adsorbing boron and phosphorus in the trichlorosilane, and the filtering mechanism is used for filtering the impurities in the trichlorosilane. The feeding pipeline and the discharging pipeline are both connected to the incoming material pipeline, and a control valve is arranged on the incoming material pipeline between the feeding pipeline and the discharging pipeline. The system is reasonable in design, and the adsorption mechanism for removing boron and phosphorus elements is additionally arranged in the system, so that the content of boron and phosphorus in trichlorosilane can be re |
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