MULTI-CHAMBER PLASMA PROCESSING APPARATUS

The utility model discloses a multi-cavity plasma processing device, which comprises a plurality of processing cavities, and each processing cavity comprises a base arranged in the cavity and used for bearing a wafer, a gas injection device used for introducing reaction gas and a spectrum detection device used for judging a process end point in the processing cavity, the plurality of treatment cavities are correspondingly communicated with the plurality of second pipelines; the pressure detection device is communicated with the plurality of second pipelines through a first pipeline so as to detect the pressure in the plurality of processing cavities, and each second pipeline is provided with a valve; and the controller is used for receiving the process end point signal of the spectrum detection device and controlling the valve corresponding to the chamber where the spectrum detection device is located to be switched off according to the process end point signal. According to the utility model, the air pressur