Plasma cleaning module

The utility model relates to the field of plasma etching, and discloses a plasma cleaning module, which comprises two gas exhaust components and at least two electrode plates, the plurality of electrode plates are sequentially arranged at intervals along one direction, a gap is arranged between two...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WANG JUNFENG, LI HUI, DENG JINBIAO, PENG ZIYANG, YE RONGKANG, FENG RUIQING, ZHOU MIN, LIU MOUMIAO, LI ZHIYUE, XIE WENBIAO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The utility model relates to the field of plasma etching, and discloses a plasma cleaning module, which comprises two gas exhaust components and at least two electrode plates, the plurality of electrode plates are sequentially arranged at intervals along one direction, a gap is arranged between two adjacent electrode plates, the two gas exhaust components are used for oppositely spraying gas to be ionized into the gap, and the two gas exhaust components are used for oppositely spraying the gas to be ionized into the gap. Every two adjacent electrode plates generate an alternating electric field when powered on, a magnetic field intersecting with the alternating electric field is arranged in the gap, and under the combined action of the alternating electric field and the magnetic field, reciprocating motion of electrons is changed into spiral rotation motion, so that the stroke of the electrons is increased, the collision frequency of the electrons and neutral particles is increased, and the efficiency of the