Plasma cleaning module with bidirectional waterway and plasma cleaning equipment
The utility model relates to the technical field of plasma etching, and discloses a plasma cleaning module with a bidirectional waterway and plasma cleaning equipment, the plasma cleaning module comprises at least two electrode plates which are sequentially arranged at intervals along one direction,...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model relates to the technical field of plasma etching, and discloses a plasma cleaning module with a bidirectional waterway and plasma cleaning equipment, the plasma cleaning module comprises at least two electrode plates which are sequentially arranged at intervals along one direction, a gap for placing a to-be-cleaned object is formed between every two adjacent electrode plates, the polarities of every two adjacent electrode plates are opposite, so that an electric field for ionizing gas is formed in each gap, and a bidirectional water path is formed in each electrode plate; the two-way water way is provided with a liquid inlet used for allowing cooling liquid to enter and a liquid outlet used for allowing the cooling liquid to be discharged, and the liquid inlet and the liquid outlet are arranged adjacently. According to the technical scheme, the liquid inlet and the liquid outlet are adjacently arranged, so that cooling liquid can be discharged outwards only after entering the electrode plate |
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