Simple MOCVD (Metal Organic Chemical Vapor Deposition) in-situ measurement device

The utility model discloses a simple MOCVD (Metal Organic Chemical Vapor Deposition) in-situ measurement device, which comprises a reaction chamber, the graphite support is arranged in the reaction chamber, and an epitaxial wafer is arranged on the graphite support; the two lifting platforms are sym...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LI YAOZE, LUO DEKUN, JIANG RUKAI, SUN WENHONG, LI LEI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The utility model discloses a simple MOCVD (Metal Organic Chemical Vapor Deposition) in-situ measurement device, which comprises a reaction chamber, the graphite support is arranged in the reaction chamber, and an epitaxial wafer is arranged on the graphite support; the two lifting platforms are symmetrically arranged on the left side and the right side of the reaction chamber and are used for lifting; the two lifting tables are a first lifting table and a second lifting table in sequence from left to right; the laser device is connected with the first lifting platform in a manner of swinging up and down and swinging back and forth, and the laser device is driven by a first swinging mechanism to swing up and down and swing back and forth; the detector is connected with the second lifting platform in a manner of swinging up and down and swinging back and forth, and the detector is driven by a second swinging mechanism to swing up and down and swing back and forth; and a control device. The MOCVD in-situ measur