Isolating membrane for wafer production and wafer assembly
The utility model particularly relates to an isolating membrane for wafer production and a wafer assembly, the isolating membrane is a three-layer co-extrusion structure and comprises a first membrane layer, a middle membrane layer and a second membrane layer which are sequentially arranged, the mid...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model particularly relates to an isolating membrane for wafer production and a wafer assembly, the isolating membrane is a three-layer co-extrusion structure and comprises a first membrane layer, a middle membrane layer and a second membrane layer which are sequentially arranged, the middle membrane layer is a polyethylene layer, a polypropylene layer, a polystyrene layer or a polycarbonate layer which have an antistatic effect, and the second membrane layer is a polyethylene layer, a polypropylene layer, a polystyrene layer or a polycarbonate layer which has an antistatic effect. And three-dimensional dot matrixes are uniformly arranged on the upper surface of the first film layer and the lower surface of the second film layer. The isolating membrane can be used as a direct contact isolating functional membrane of a wafer, is not easy to drop scraps, plays a role in electrostatic protection, has certain stiffness, can be easily separated from the wafer, and does not generate electrostatic adsorpt |
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