110-inch ultra-large TFT (Thin Film Transistor) scratch-resistant polaroid

The utility model discloses a 110-inch ultra-large TFT (Thin Film Transistor) scratch-resistant polaroid which comprises a polaroid, the polaroid comprises a super-phase-difference polyethylene glycol terephthalate base film with an anti-glare surface treatment layer, a stretched polyvinyl alcohol f...

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Bibliographische Detailangaben
Hauptverfasser:	CHEN XIN, CAI NING, LIANG HEFENG, NAH SANG-HYUN, PARK KI-SUNG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	The utility model discloses a 110-inch ultra-large TFT (Thin Film Transistor) scratch-resistant polaroid which comprises a polaroid, the polaroid comprises a super-phase-difference polyethylene glycol terephthalate base film with an anti-glare surface treatment layer, a stretched polyvinyl alcohol film and an optical-grade polymethyl methacrylate film, and the super-phase-difference polyethylene glycol terephthalate base film is provided with an anti-glare surface treatment layer. The polaroid further comprises a protective film, a pressure-sensitive adhesive and a release film. According to the utility model, the anti-glare surface treatment layer and the protective film are arranged, so that the polaroid can realize a scratch-proof effect. 本实用新型公开了一种110英寸超大型TFT耐划伤偏光片，包括偏光片，包括偏光片，所述偏光片包括带抗眩光表面处理层的超位相差聚对苯二甲酸乙二醇酯基膜、拉伸后的聚乙烯醇薄膜和光学级聚甲基丙烯酸甲酯薄膜，所述偏光片还包括保护膜、压敏胶和离型膜。本实用新型通过抗眩光表面处理层和保护膜的设置，使偏光片可实现防划伤的效果。