Single crystal furnace with thermal field structure
The utility model relates to the technical field of monocrystalline silicon production, in particular to a single crystal furnace with a thermal field structure. A single crystal furnace with a thermal field structure comprises a single crystal furnace barrel with an upper opening and a lower openin...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model relates to the technical field of monocrystalline silicon production, in particular to a single crystal furnace with a thermal field structure. A single crystal furnace with a thermal field structure comprises a single crystal furnace barrel with an upper opening and a lower opening and the thermal field structure, the single crystal furnace barrel is connected with at least one first limiting block, and the thermal field structure is provided with second limiting blocks corresponding to the first limiting blocks in position and number. The thermal field structure is in detachable limiting connection with the first limiting block through the second limiting block in the single crystal furnace barrel. The thermal field can be integrated, and the device can be assembled in advance and can be directly installed and used on a single crystal furnace site. The integral thermal field is organically combined with single crystal furnace equipment, so that the thermal field is conveniently disassemble |
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