Superconducting cavity plasma cleaning gas circuit device
The utility model relates to the technical field of plasma cleaning of superconducting cavities, in particular to a plasma cleaning gas circuit device of a superconducting cavity. Comprising an upstream gas path system and a downstream gas path system which are connected to the two ends of a superco...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model relates to the technical field of plasma cleaning of superconducting cavities, in particular to a plasma cleaning gas circuit device of a superconducting cavity. Comprising an upstream gas path system and a downstream gas path system which are connected to the two ends of a superconducting cavity, and the upstream gas path system comprises a high-purity inert gas supply mechanism and a high-purity oxygen supply mechanism; the downstream gas path system comprises a six-way I connected with the superconducting cavity, and two ports of the six-way I are respectively connected with a micro-leakage valve and a full-range vacuum gauge; according to the device, on the basis of meeting the basic function of plasma cleaning of the superconducting cavity, the purity of plasma experimental gas can be remarkably improved, the superconducting cavity is prevented from being polluted by impurities, and the accuracy of downstream monitoring signals is ensured; and after the plasma cleaning is finished, the |
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