Quartz window heat preservation device, plasma reaction equipment and semiconductor processing machine table
The utility model provides a quartz window heat preservation device, plasma reaction equipment and semiconductor processing machine table, the quartz window heat preservation device comprises a cylinder body and a quartz window, the cylinder body comprises a first cavity and a second cavity from top...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model provides a quartz window heat preservation device, plasma reaction equipment and semiconductor processing machine table, the quartz window heat preservation device comprises a cylinder body and a quartz window, the cylinder body comprises a first cavity and a second cavity from top to bottom, the first cavity and the second cavity are separated by the quartz window, and the quartz window is arranged in the first cavity. A ventilation hole is formed in the cylinder body wall corresponding to the first cavity, a hot air fan is correspondingly arranged in the ventilation hole, and the hot air fan is used for conveying hot air into the first cavity. The heating device can heat the quartz window in time, control the temperature of the quartz window, reduce the preheating time of equipment and improve the yield of products.
本实用新型提供一种石英窗保温装置、等离子体反应设备及半导体加工机台,所述石英窗保温装置包括缸体和石英窗,所述缸体从上至下包括第一腔体和第二腔体,所述第一腔体和所述第二腔体被所述石英窗分隔,所述第一腔体对应的缸体壁上设有通风孔,所述通风孔内对应设有热风扇,所述热风扇用于向所述第一腔体中输送热气。本实用新型能够及时加热石英窗,控制石英窗的温度,减少设备预 |
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