MPCVD equipment

The utility model discloses MPCVD equipment which comprises a reaction chamber used for accommodating reaction gas; the cooling base station is arranged in the reaction chamber; the bearing substrate is arranged on the cooling base station and is used for bearing the seed crystal; and the microwave...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	WEI HAOYIN, FAN JIE, GAO YUQIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	The utility model discloses MPCVD equipment which comprises a reaction chamber used for accommodating reaction gas; the cooling base station is arranged in the reaction chamber; the bearing substrate is arranged on the cooling base station and is used for bearing the seed crystal; and the microwave system is used for releasing microwaves for exciting the reaction gas to generate active groups into the reaction chamber so as to promote the active groups to react and complete crystal growth on the seed crystal. Wherein the bearing substrate comprises a base part, which is arranged on the cooling base station; the middle part is connected with one side, far away from the cooling base station, of the base part; the loading part is connected with one side, far away from the base part, of the middle part; and a groove portion formed among the base portion, the loading portion, and the intermediate portion and surrounding the intermediate portion. The MPCVD equipment can solve the problems that the bearing substrate