High-performance super-long large rotating titanium tube target material for large wafer manufacturing process

The utility model provides a high-performance high-precision super-long large-scale rotating titanium tube target material for a large wafer, which comprises a pure titanium tube target material body, the body comprises an outer surface (1), an inner wall (3), a left end part and a right end part, the left end part and the right end part are symmetrical, the end parts are mounting parts which are matched with vacuum sputtering coating equipment and are in sealed connection, and the inner wall (3) is arranged on the outer surface (1) of the pure titanium tube target material body. And the mounting part structurally comprises a shoulder sinking part (2), a groove part (4), a circular groove (5) and a spigot part (6). The length of the product exceeds 2.5 m, the outer diameter of the titanium tube target is larger than or equal to 128 mm, the thickness of the tube wall is 13-33 mm, the degree of finish is Ra1.0, the titanium purity reaches 99.9995%, the requirement of the 8-12 inch wafer manufacturing process fo