Gas diffuser for loading chamber and loading chamber

The utility model provides a gas diffuser for a loading cavity and the loading cavity. The gas diffuser for the loading cavity comprises a cap body and a cap edge arranged along the tail end of the cap body, a plurality of rows of diffusion holes are formed in the side wall of the cap body so that g...

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Hauptverfasser: SUN XIAOSHENG, LIU YANBIN
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LIU YANBIN
description The utility model provides a gas diffuser for a loading cavity and the loading cavity. The gas diffuser for the loading cavity comprises a cap body and a cap edge arranged along the tail end of the cap body, a plurality of rows of diffusion holes are formed in the side wall of the cap body so that gas entering from a cap opening of the cap body can be exhausted into the loading cavity, and the cap edge is installed in the loading cavity through a plurality of fixing pieces. According to the utility model, the time required for vacuum breaking of the loading cavity can be effectively reduced, and the cost is effectively reduced. 本实用新型提供加载腔用气体扩散器以及加载腔。所述加载腔用气体扩散器包括帽体以及沿所述帽体末端设置的帽沿,所述帽体的侧壁上开设有多排扩散孔,以将从其帽口进入的气体排入加载腔中,所述帽沿通过多个固定件安装在所述加载腔中。本实用新型能有效减小加载腔破空所需时间并有效降低成本。
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According to the utility model, the time required for vacuum breaking of the loading cavity can be effectively reduced, and the cost is effectively reduced. 本实用新型提供加载腔用气体扩散器以及加载腔。所述加载腔用气体扩散器包括帽体以及沿所述帽体末端设置的帽沿,所述帽体的侧壁上开设有多排扩散孔,以将从其帽口进入的气体排入加载腔中,所述帽沿通过多个固定件安装在所述加载腔中。本实用新型能有效减小加载腔破空所需时间并有效降低成本。</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230804&amp;DB=EPODOC&amp;CC=CN&amp;NR=219470194U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230804&amp;DB=EPODOC&amp;CC=CN&amp;NR=219470194U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUN XIAOSHENG</creatorcontrib><creatorcontrib>LIU YANBIN</creatorcontrib><title>Gas diffuser for loading chamber and loading chamber</title><description>The utility model provides a gas diffuser for a loading cavity and the loading cavity. 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According to the utility model, the time required for vacuum breaking of the loading cavity can be effectively reduced, and the cost is effectively reduced. 本实用新型提供加载腔用气体扩散器以及加载腔。所述加载腔用气体扩散器包括帽体以及沿所述帽体末端设置的帽沿,所述帽体的侧壁上开设有多排扩散孔,以将从其帽口进入的气体排入加载腔中,所述帽沿通过多个固定件安装在所述加载腔中。本实用新型能有效减小加载腔破空所需时间并有效降低成本。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBxTyxWSMlMSystTi1SSMsvUsjJT0zJzEtXSM5IzE0CiiXmpaCL8TCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeGc_I0NLE3MDIBEaakyUIgBV6i0m</recordid><startdate>20230804</startdate><enddate>20230804</enddate><creator>SUN XIAOSHENG</creator><creator>LIU YANBIN</creator><scope>EVB</scope></search><sort><creationdate>20230804</creationdate><title>Gas diffuser for loading chamber and loading chamber</title><author>SUN XIAOSHENG ; LIU YANBIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN219470194UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SUN XIAOSHENG</creatorcontrib><creatorcontrib>LIU YANBIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUN XIAOSHENG</au><au>LIU YANBIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Gas diffuser for loading chamber and loading chamber</title><date>2023-08-04</date><risdate>2023</risdate><abstract>The utility model provides a gas diffuser for a loading cavity and the loading cavity. 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language chi ; eng
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subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Gas diffuser for loading chamber and loading chamber
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