Chemical vapor deposition equipment

The utility model discloses chemical vapor deposition equipment, which comprises a reaction cavity, the base is positioned in the reaction cavity; the fixed plate is positioned outside the reaction cavity; the supporting mechanism comprises a supporting rod and a driving assembly; the first end of the supporting rod is connected with a driving assembly, the second end of the supporting rod is connected with the base, and the driving assembly is used for driving the supporting rod to rotate and/or ascend and descend; the supporting mechanism is installed on the fixing plate and completely located on one side of the fixing plate. According to the utility model, the supporting mechanism of the base is fixed on other parts outside the reaction cavity, so that the stress condition of the reaction cavity is optimized, and the risk that the reaction cavity is damaged due to overlarge stress is reduced. 本实用新型公开了一种化学气相沉积设备，包括：反应腔；基座，位于所述反应腔内；固定板，位于所述反应腔外；支撑机构，包括支撑杆和驱动组件；所述支撑杆的第一端与驱动组件连接，所述支撑杆的第二端与所述基座连接，所述驱动组件用于驱动所述支撑