Polishing system

The utility model discloses a polishing system, which comprises a polishing solution supply device and a polishing device, the polishing device is matched with the polishing solution supply device, and the polishing solution supply device comprises a discharge port; the polishing device comprises an...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: FU YUQI, JIAN LIMIN, HU TIANCHANG
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The utility model discloses a polishing system, which comprises a polishing solution supply device and a polishing device, the polishing device is matched with the polishing solution supply device, and the polishing solution supply device comprises a discharge port; the polishing device comprises an upper disc and a lower disc, an injection port is formed in one side of the upper disc, a groove is formed in the other side of the upper disc, and the injection port is communicated with the groove and corresponds to the discharge port; the lower disc is arranged corresponding to the upper disc, an accommodating space is defined between the upper disc and the lower disc, and the accommodating space is communicated with the groove; the carrier plate is rotatably arranged between the upper disc and the lower disc, and a holding hole is formed in the carrier plate; and the polishing plate is arranged on the side, facing the carrier plate, of the lower plate and the side, facing the carrier plate, of the upper plate.