Exposure system and exposure device

The utility model discloses an exposure system and an exposure device. The exposure system comprises at least two light sources, wherein the wavelengths of light emitted by the light sources are different; the light combiner is used for combining the emergent light of the at least two light sources...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG WEI, DONG GANGQIANG, IKUSAO, HU GUANGBAO, GONG ZHIQING, LYU LONGFEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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