Exposure system and exposure device

The utility model discloses an exposure system and an exposure device. The exposure system comprises at least two light sources, wherein the wavelengths of light emitted by the light sources are different; the light combiner is used for combining the emergent light of the at least two light sources and then outputting the combined light; a light path assembly and a calibration and motion platform, the calibration and motion platform is used for placing a material to be exposed, and the light path assembly is used for transmitting light output by the light combiner to the calibration and motion platform; and the control assembly stores a preset formula, and the control assembly is configured to control the output light intensity of each light source according to the preset formula. According to the utility model, the problems that the formula selection and exposure of the mask material and the operable window of the developing effect are more limited, and the light source cannot be switched temporarily or in a