Magnetron sputtering equipment and anode thereof
The utility model discloses magnetron sputtering equipment. Comprising a shell, the shell is provided with a cavity, an opening is formed in the shell, a mounting plate is arranged at the opening and seals the opening, a target material and an anode are arranged in the cavity, an insulator is arrang...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model discloses magnetron sputtering equipment. Comprising a shell, the shell is provided with a cavity, an opening is formed in the shell, a mounting plate is arranged at the opening and seals the opening, a target material and an anode are arranged in the cavity, an insulator is arranged on the inner side of the mounting plate, the anode is arranged on the insulator and is adjacent to the target material, the anode comprises an anode shell, a magnetic boot and a magnet, and the magnetic boot and the magnet are both arranged in the anode shell. The plurality of magnets are arranged on the magnetic boot at intervals; the anode shell is an anode of a conductive material connected to a power supply. When the magnetron sputtering equipment is used, a large number of electrons can be attracted to the anode through the electric field and the magnetic field of the anode, so that the base material can be prevented from being bombarded by the large number of electrons, the temperature of the base material |
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