Double-sided integrated photoetching device

The utility model provides a double-sided integrated photoetching device which comprises a photoetching equipment assembly and a material changing mechanism, the photoetching equipment assembly comprises a processing table, a photoetching host and a double-sided integrated photoetching table; the ma...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIU YIBIAO, FU RENXUAN, SONG XIANWEN, XU YONGJUN, CHEN QIMING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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