Double-sided integrated photoetching device

The utility model provides a double-sided integrated photoetching device which comprises a photoetching equipment assembly and a material changing mechanism, the photoetching equipment assembly comprises a processing table, a photoetching host and a double-sided integrated photoetching table; the material changing mechanism comprises a rotary table and two air cylinders. According to the utility model, the circuit board to be exposed is limited through the storage plates, then the storage plates are driven by the piston rods of the air cylinders to be attached to the rotary table, then the rotary table is driven by the output shaft of the servo motor to rotate, and the rotating rotary table drives the two storage plates to exchange positions; then the piston rod of the air cylinder drives the object placing plates to reset, so that the circuit board is fed into the double-sided integrated photoetching table, then double-sided exposure treatment is carried out on the circuit board by utilizing the mask plate t