Heat treatment device

The utility model relates to a heat treatment device. The purpose of the present invention is to efficiently collect sublimates and reduce the influence on film thickness distribution. The heat treatment apparatus includes a heating portion, a chamber, an exhaust portion, a partition portion, and a switching portion. The heating unit supports and heats a substrate on which a film of a processing liquid is formed. The chamber is disposed so as to surround the substrate supported by the heating unit. The exhaust part exhausts gas from the space in the chamber through an exhaust port located around the heating part. The partition part divides the space in the chamber into a first space in which the substrate on the heating part is exposed and a second space located above the first space. The switching unit switches between a first state in which the gas is discharged by the exhaust unit through the first space and a second state in which the gas is discharged by the exhaust unit through the second space. 本实用新型涉及