Wafer cleaning device

The utility model discloses a wafer cleaning device. The wafer cleaning device comprises a shell; the supporting assembly is arranged in the shell, comprises a driving wheel and a driven wheel, and is used for vertically supporting and driving the wafer to rotate; the cleaning brush is horizontally arranged in the shell and can rotate around the axis so as to brush the wafer; and the position checking assembly is used for measuring and adjusting the horizontal position of the driving wheel and/or the driven wheel, so that the driving wheel and the driven wheel are located in the same plane. 本实用新型公开了一种晶圆清洗装置，其包括：壳体；支撑组件，设置于壳体中，其包括主动轮和从动轮，以竖向支撑并带动晶圆转动；清洗刷，水平设置于壳体中并能够绕轴线转动，以对晶圆进行刷洗；位置校核组件，以测量和调整主动轮和/或从动轮的水平位置，使得主动轮和从动轮位于同一平面中。