Wafer plasma cleaning device

The utility model discloses a wafer plasma cleaning device, and belongs to the technical field of plasma cleaning devices.The wafer plasma cleaning device comprises a box body with an opening formed in the front side, a box door is hinged to the opening of the box body, a horizontal rotating disc is arranged on the lower side in the box body, and a vertical first rotating shaft is fixedly connected to the middle of the lower end of the rotating disc; the lower end of the first rotating shaft is rotationally connected with the inner wall of the lower side of the box body through a first rolling bearing, a motor is fixedly arranged at the center of the bottom of the box body, and the output end of the motor penetrates into the box body and is fixedly connected with the lower end of the first rotating shaft; a plurality of evenly-distributed containing grooves are formed in the upper end of the containing disc, sliding holes are vertically formed in the centers of the bottoms of the containing grooves, and the i