Vacuum detection instrument for semiconductor equipment
The utility model discloses a semiconductor equipment vacuum detection instrument, which relates to the technical field of semiconductor equipment vacuum detection and particularly comprises a workbench, a helium mass spectrometer leak detector is arranged on the upper surface of the workbench, a ro...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | YANG JIMAO ZHAO YIJIE |
description | The utility model discloses a semiconductor equipment vacuum detection instrument, which relates to the technical field of semiconductor equipment vacuum detection and particularly comprises a workbench, a helium mass spectrometer leak detector is arranged on the upper surface of the workbench, a rotary joint is arranged on the upper surface of a fixed block through a first annular frame, and a sealing gasket is arranged at the other end of the rotary joint. A rotating shaft is arranged on the upper surface of the fixing block through a hinge block, a sliding groove is formed in the upper surface of the workbench, a sliding clamping block is slidably connected to the position, located on the inner side wall of the sliding groove, of the upper surface of the workbench, a clamping block is arranged on the upper surface of the sliding clamping block through a second annular frame, and a supporting frame is arranged on the rear side of the upper surface of the workbench. A sprayer is arranged on the lower surface |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN218628835UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN218628835UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN218628835UU3</originalsourceid><addsrcrecordid>eNrjZDAPS0wuLc1VSEktSU0uyczPU8jMKy4pKs1NzStRSMsvUihOzc1Mzs9LKU0uAfJSC0szC0ByPAysaYk5xam8UJqbQcnNNcTZQze1ID8-tbggMTk1L7Uk3tnPyNDCzMjCwtg0NNSYKEUApZUvzw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Vacuum detection instrument for semiconductor equipment</title><source>esp@cenet</source><creator>YANG JIMAO ; ZHAO YIJIE</creator><creatorcontrib>YANG JIMAO ; ZHAO YIJIE</creatorcontrib><description>The utility model discloses a semiconductor equipment vacuum detection instrument, which relates to the technical field of semiconductor equipment vacuum detection and particularly comprises a workbench, a helium mass spectrometer leak detector is arranged on the upper surface of the workbench, a rotary joint is arranged on the upper surface of a fixed block through a first annular frame, and a sealing gasket is arranged at the other end of the rotary joint. A rotating shaft is arranged on the upper surface of the fixing block through a hinge block, a sliding groove is formed in the upper surface of the workbench, a sliding clamping block is slidably connected to the position, located on the inner side wall of the sliding groove, of the upper surface of the workbench, a clamping block is arranged on the upper surface of the sliding clamping block through a second annular frame, and a supporting frame is arranged on the rear side of the upper surface of the workbench. A sprayer is arranged on the lower surface</description><language>chi ; eng</language><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; TESTING ; TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES ; TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230314&DB=EPODOC&CC=CN&NR=218628835U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230314&DB=EPODOC&CC=CN&NR=218628835U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANG JIMAO</creatorcontrib><creatorcontrib>ZHAO YIJIE</creatorcontrib><title>Vacuum detection instrument for semiconductor equipment</title><description>The utility model discloses a semiconductor equipment vacuum detection instrument, which relates to the technical field of semiconductor equipment vacuum detection and particularly comprises a workbench, a helium mass spectrometer leak detector is arranged on the upper surface of the workbench, a rotary joint is arranged on the upper surface of a fixed block through a first annular frame, and a sealing gasket is arranged at the other end of the rotary joint. A rotating shaft is arranged on the upper surface of the fixing block through a hinge block, a sliding groove is formed in the upper surface of the workbench, a sliding clamping block is slidably connected to the position, located on the inner side wall of the sliding groove, of the upper surface of the workbench, a clamping block is arranged on the upper surface of the sliding clamping block through a second annular frame, and a supporting frame is arranged on the rear side of the upper surface of the workbench. A sprayer is arranged on the lower surface</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><subject>TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES</subject><subject>TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAPS0wuLc1VSEktSU0uyczPU8jMKy4pKs1NzStRSMsvUihOzc1Mzs9LKU0uAfJSC0szC0ByPAysaYk5xam8UJqbQcnNNcTZQze1ID8-tbggMTk1L7Uk3tnPyNDCzMjCwtg0NNSYKEUApZUvzw</recordid><startdate>20230314</startdate><enddate>20230314</enddate><creator>YANG JIMAO</creator><creator>ZHAO YIJIE</creator><scope>EVB</scope></search><sort><creationdate>20230314</creationdate><title>Vacuum detection instrument for semiconductor equipment</title><author>YANG JIMAO ; ZHAO YIJIE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN218628835UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>TESTING</topic><topic>TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES</topic><topic>TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR</topic><toplevel>online_resources</toplevel><creatorcontrib>YANG JIMAO</creatorcontrib><creatorcontrib>ZHAO YIJIE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANG JIMAO</au><au>ZHAO YIJIE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vacuum detection instrument for semiconductor equipment</title><date>2023-03-14</date><risdate>2023</risdate><abstract>The utility model discloses a semiconductor equipment vacuum detection instrument, which relates to the technical field of semiconductor equipment vacuum detection and particularly comprises a workbench, a helium mass spectrometer leak detector is arranged on the upper surface of the workbench, a rotary joint is arranged on the upper surface of a fixed block through a first annular frame, and a sealing gasket is arranged at the other end of the rotary joint. A rotating shaft is arranged on the upper surface of the fixing block through a hinge block, a sliding groove is formed in the upper surface of the workbench, a sliding clamping block is slidably connected to the position, located on the inner side wall of the sliding groove, of the upper surface of the workbench, a clamping block is arranged on the upper surface of the sliding clamping block through a second annular frame, and a supporting frame is arranged on the rear side of the upper surface of the workbench. A sprayer is arranged on the lower surface</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN218628835UU |
source | esp@cenet |
subjects | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR |
title | Vacuum detection instrument for semiconductor equipment |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-21T17%3A50%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YANG%20JIMAO&rft.date=2023-03-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN218628835UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |