Wafer alignment device

The utility model provides a wafer alignment device. The wafer alignment device at least comprises a base assembly, a first movement system, a second movement system, an alignment detection system and an in-place detection system. According to the utility model, the alignment state is fed back in re...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: XIE YIREN, YU HONGLIANG, WU HUOLIANG, CHEN CHUNYUAN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The utility model provides a wafer alignment device. The wafer alignment device at least comprises a base assembly, a first movement system, a second movement system, an alignment detection system and an in-place detection system. According to the utility model, the alignment state is fed back in real time by combining the adjustment precision grading of the motion platform and the cooperative application of the optical lens of the detection system, so that the alignment precision between wafers and the in-place precision of the motion platform are improved; meanwhile, the driving systems of different dimensions of the detection system are tiled and separated, so that the mutual influence during adjustment of the driving systems of different dimensions is reduced, the adjustment precision is improved, and the height in the third direction is reduced; in addition, by means of the air flotation guide connection design, center rotation motion in a two-dimensional plane is achieved, alignment precision can be imp