Bubble filtering system of wafer etching equipment
The utility model provides a bubble filtering system of wafer etching equipment. The bubble filtering system comprises a liquid supply channel, a bubble filter, a liquid outlet channel and a flow meter. The liquid supply channel is used for providing liquid medicine containing bubbles. The bubble fi...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The utility model provides a bubble filtering system of wafer etching equipment. The bubble filtering system comprises a liquid supply channel, a bubble filter, a liquid outlet channel and a flow meter. The liquid supply channel is used for providing liquid medicine containing bubbles. The bubble filter comprises a sealed box body and a filter layer, the filter layer is arranged in the sealed box body, the sealed box body is provided with a liquid medicine inlet, a liquid medicine outlet and an exhaust outlet, the liquid medicine inlet is connected to the liquid supply channel, and the liquid medicine outlet and the exhaust outlet are separated by the filter layer, so that the liquid medicine flows out from the liquid medicine outlet, and bubbles are discharged from the exhaust outlet. One end of the liquid outlet channel is connected with the liquid medicine outlet. The flow meter is arranged in the liquid outlet channel and used for measuring the flow of the liquid medicine flowing through the liquid outlet |
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