Base and chemical vapor deposition equipment

The utility model provides a base which is used for chemical vapor deposition equipment and comprises a base bottom surface which is a plane or a downwards concave cambered surface; the substrate bearing surface extends upwards and outwards from the outer edge of the bottom surface of the base, the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YAN TAO, CONG HAI, FU SHILIANG, JIANG YONG, CHEN ENYI
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The utility model provides a base which is used for chemical vapor deposition equipment and comprises a base bottom surface which is a plane or a downwards concave cambered surface; the substrate bearing surface extends upwards and outwards from the outer edge of the bottom surface of the base, the substrate bearing surface is an inclined surface which is inclined downwards from outside to inside, and the substrate bearing surface is in contact with the outer edge of the substrate so as to bear the substrate; and the plurality of diversion trenches are arranged on the substrate bearing surface and are used for discharging process gas and/or purified gas between the back surface of the substrate and the base. The utility model further provides chemical vapor deposition equipment. According to the utility model, heat around the lifting pin hole can be quickly conducted away, so that the surface temperature of the substrate is uniform; meanwhile, sediments on the back surface of the substrate can be reduced, and