Wafer laser annealing equipment based on scanning rotating mirror

The utility model particularly relates to wafer laser annealing equipment based on a scanning rotating mirror, which comprises a laser, a beam expander, a polarization element, a reflector, a beam shaper, the scanning rotating mirror, a telecentric field lens, a motion platform, a wafer carrying table, a camera system and a computer, the motion platform comprises a first motion platform, a second motion platform and a third motion platform which have different motion directions, a base is movably installed at the bottom of the first motion platform, the second motion platform is located at the top of the first motion platform, the third motion platform is located on the second motion platform, and the wafer carrying platform is installed on the third motion platform. A bearing structure mechanical structure plane is arranged on the base, a light beam emitted by the laser is expanded by the beam expander, passes through the polarization element and then enters the light beam shaper for shaping through the refl