Device for improving uniformity of plasma photoresist removing equipment

The utility model discloses a device for improving the uniformity of plasma degumming equipment, which comprises a screen body, a plurality of gas discharge holes are uniformly distributed on the circumference of the screen body, and the gas discharge holes are spirally distributed. Compared with the prior art, the utility model has the advantages that under the action of the spirally distributed gas exhaust holes, the flow direction of gas is spiral, and the contact time of the gas and the edge of a wafer is prolonged, so that the reaction uniformity is optimized, and the process capability of equipment is improved. 本实用新型公开了一种改善等离子去胶设备均匀性的装置，包括筛体，所述筛体上设有多个在圆周上平均分布的气体排出孔，所述气体排出孔呈螺旋状分布。本实用新型与现有技术相比的优点是：在本实用新型的呈螺旋状分布的气体排出孔作用下，气体流向为螺旋形，增加了气体和晶圆边缘接触时间，从而优化反应均匀性，提升设备的工艺能力。