Anti-static damage structure for photomask

The utility model provides an anti-static damage structure for a photomask, and belongs to the technical field of photomasks, the anti-static damage structure for the photomask specifically comprises an anti-static ring arranged around a customer pattern area of the photomask, and the anti-static ri...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHANG JIAWEI, GUO GUIQI, WEI LIPING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR NATURALLY-OCCURRING ELECTRICITY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS STATIC ELECTRICITY
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