Anti-static damage structure for photomask

The utility model provides an anti-static damage structure for a photomask, and belongs to the technical field of photomasks, the anti-static damage structure for the photomask specifically comprises an anti-static ring arranged around a customer pattern area of the photomask, and the anti-static ri...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ZHANG JIAWEI, GUO GUIQI, WEI LIPING
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The utility model provides an anti-static damage structure for a photomask, and belongs to the technical field of photomasks, the anti-static damage structure for the photomask specifically comprises an anti-static ring arranged around a customer pattern area of the photomask, and the anti-static ring is arranged to be an insulated closed-loop structure along the periphery of the customer pattern area. The antistatic ring is used for preventing electrostatic discharge from damaging the customer pattern area; a charge release area is arranged at the position away from the periphery of the antistatic ring by a certain distance and is of a strip-shaped structure, one end of the strip-shaped structure starts from the first edge of the photomask, the other end of the strip-shaped structure starts from the second edge of the photomask, and the first edge and the second edge are opposite edges. And the charge release area is used for leading charges generated by static electricity to the outside of the customer patt