Linear image sensor and photoetching mask

The utility model discloses a linear image sensor and a photoetching mask, the linear image sensor comprises a first chip area and a second chip area, the first chip area and the second chip area are sequentially arranged in a first preset direction, and the circuit arrangement of the first chip are...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HENG JIAWEI, HOU JINJIAN, MO YAOWU, XU CHEN, CHEN PENG, REN GUANJING
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The utility model discloses a linear image sensor and a photoetching mask, the linear image sensor comprises a first chip area and a second chip area, the first chip area and the second chip area are sequentially arranged in a first preset direction, and the circuit arrangement of the first chip area is the same as the circuit arrangement of the second chip area; the chip further comprises a plurality of pixels and a conductive circuit extending in the second preset direction, the pixels are arranged in the first chip area and the second chip area, the pixels in the first chip area and the second chip area are electrically connected with the conductive circuit, and an included angle is formed between the second preset direction and the first preset direction. The linear image sensor is divided into the first chip area and the second chip area which are the same in circuit arrangement in the first preset direction, and the conductive circuits connected with the pixels extend in the second preset direction, so