Ultra-light release type low-silicon-transfer solvent-resistant double-sided anti-static release film
The utility model relates to an ultra-light release type low-silicon-transfer solvent-resistant double-sided antistatic release film, and relates to the technical field of ultra-light release film processing. The ultra-light release low-silicon-transfer solvent-resistant double-sided anti-static rel...
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| creator | LIU HULIN LI YANGLIN ZHOU YUNYAO XI ZHONGFEI |
| description | The utility model relates to an ultra-light release type low-silicon-transfer solvent-resistant double-sided antistatic release film, and relates to the technical field of ultra-light release film processing. The ultra-light release low-silicon-transfer solvent-resistant double-sided anti-static release film comprises an anti-aging layer, a second anti-static layer, a base material, a first anti-static layer and a solvent-resistant release layer which are overlapped in sequence, the second anti-static layer is positioned between the anti-aging layer and the base material; the first anti-static layer is positioned between the base material and the solvent-resistant release layer; and randomly distributed organic silicon powder is coated on the surface of the solvent-resistant release layer. According to the release film, the anti-static layer and the solvent-resistant release layer are overlaid on the surface of the base material, and meanwhile, the organic silicon powder is randomly distributed on the outer l |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN218058866UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN218058866UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN218058866UU3</originalsourceid><addsrcrecordid>eNqNzD0LwjAUheEsDqL-h-Ae8ANL96I4Odm5xPRUL1yTkntV_PdmEGenAy8PZ2rQsmbvmK43tRkML7D6HmE5vZwQU0jRFRJlQLaS-ImoLkNI1Ee1fXpcGEX26G0J5EpXCr-zgfg-N5PBs2Dx3ZlZHvbn5ugwpg4y-oAI7ZrTZl2vdnVdVW27_Qt9AB1vQNo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Ultra-light release type low-silicon-transfer solvent-resistant double-sided anti-static release film</title><source>esp@cenet</source><creator>LIU HULIN ; LI YANGLIN ; ZHOU YUNYAO ; XI ZHONGFEI</creator><creatorcontrib>LIU HULIN ; LI YANGLIN ; ZHOU YUNYAO ; XI ZHONGFEI</creatorcontrib><description>The utility model relates to an ultra-light release type low-silicon-transfer solvent-resistant double-sided antistatic release film, and relates to the technical field of ultra-light release film processing. The ultra-light release low-silicon-transfer solvent-resistant double-sided anti-static release film comprises an anti-aging layer, a second anti-static layer, a base material, a first anti-static layer and a solvent-resistant release layer which are overlapped in sequence, the second anti-static layer is positioned between the anti-aging layer and the base material; the first anti-static layer is positioned between the base material and the solvent-resistant release layer; and randomly distributed organic silicon powder is coated on the surface of the solvent-resistant release layer. According to the release film, the anti-static layer and the solvent-resistant release layer are overlaid on the surface of the base material, and meanwhile, the organic silicon powder is randomly distributed on the outer l</description><language>chi ; eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; GENERAL PROCESSES OF COMPOUNDING ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221216&DB=EPODOC&CC=CN&NR=218058866U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221216&DB=EPODOC&CC=CN&NR=218058866U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIU HULIN</creatorcontrib><creatorcontrib>LI YANGLIN</creatorcontrib><creatorcontrib>ZHOU YUNYAO</creatorcontrib><creatorcontrib>XI ZHONGFEI</creatorcontrib><title>Ultra-light release type low-silicon-transfer solvent-resistant double-sided anti-static release film</title><description>The utility model relates to an ultra-light release type low-silicon-transfer solvent-resistant double-sided antistatic release film, and relates to the technical field of ultra-light release film processing. The ultra-light release low-silicon-transfer solvent-resistant double-sided anti-static release film comprises an anti-aging layer, a second anti-static layer, a base material, a first anti-static layer and a solvent-resistant release layer which are overlapped in sequence, the second anti-static layer is positioned between the anti-aging layer and the base material; the first anti-static layer is positioned between the base material and the solvent-resistant release layer; and randomly distributed organic silicon powder is coated on the surface of the solvent-resistant release layer. According to the release film, the anti-static layer and the solvent-resistant release layer are overlaid on the surface of the base material, and meanwhile, the organic silicon powder is randomly distributed on the outer l</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzD0LwjAUheEsDqL-h-Ae8ANL96I4Odm5xPRUL1yTkntV_PdmEGenAy8PZ2rQsmbvmK43tRkML7D6HmE5vZwQU0jRFRJlQLaS-ImoLkNI1Ee1fXpcGEX26G0J5EpXCr-zgfg-N5PBs2Dx3ZlZHvbn5ugwpg4y-oAI7ZrTZl2vdnVdVW27_Qt9AB1vQNo</recordid><startdate>20221216</startdate><enddate>20221216</enddate><creator>LIU HULIN</creator><creator>LI YANGLIN</creator><creator>ZHOU YUNYAO</creator><creator>XI ZHONGFEI</creator><scope>EVB</scope></search><sort><creationdate>20221216</creationdate><title>Ultra-light release type low-silicon-transfer solvent-resistant double-sided anti-static release film</title><author>LIU HULIN ; LI YANGLIN ; ZHOU YUNYAO ; XI ZHONGFEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN218058866UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>LIU HULIN</creatorcontrib><creatorcontrib>LI YANGLIN</creatorcontrib><creatorcontrib>ZHOU YUNYAO</creatorcontrib><creatorcontrib>XI ZHONGFEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIU HULIN</au><au>LI YANGLIN</au><au>ZHOU YUNYAO</au><au>XI ZHONGFEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Ultra-light release type low-silicon-transfer solvent-resistant double-sided anti-static release film</title><date>2022-12-16</date><risdate>2022</risdate><abstract>The utility model relates to an ultra-light release type low-silicon-transfer solvent-resistant double-sided antistatic release film, and relates to the technical field of ultra-light release film processing. The ultra-light release low-silicon-transfer solvent-resistant double-sided anti-static release film comprises an anti-aging layer, a second anti-static layer, a base material, a first anti-static layer and a solvent-resistant release layer which are overlapped in sequence, the second anti-static layer is positioned between the anti-aging layer and the base material; the first anti-static layer is positioned between the base material and the solvent-resistant release layer; and randomly distributed organic silicon powder is coated on the surface of the solvent-resistant release layer. According to the release film, the anti-static layer and the solvent-resistant release layer are overlaid on the surface of the base material, and meanwhile, the organic silicon powder is randomly distributed on the outer l</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS GENERAL PROCESSES OF COMPOUNDING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
| title | Ultra-light release type low-silicon-transfer solvent-resistant double-sided anti-static release film |
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