Ultra-light release type low-silicon-transfer solvent-resistant double-sided anti-static release film

The utility model relates to an ultra-light release type low-silicon-transfer solvent-resistant double-sided antistatic release film, and relates to the technical field of ultra-light release film processing. The ultra-light release low-silicon-transfer solvent-resistant double-sided anti-static release film comprises an anti-aging layer, a second anti-static layer, a base material, a first anti-static layer and a solvent-resistant release layer which are overlapped in sequence, the second anti-static layer is positioned between the anti-aging layer and the base material; the first anti-static layer is positioned between the base material and the solvent-resistant release layer; and randomly distributed organic silicon powder is coated on the surface of the solvent-resistant release layer. According to the release film, the anti-static layer and the solvent-resistant release layer are overlaid on the surface of the base material, and meanwhile, the organic silicon powder is randomly distributed on the outer l